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Micrometer patterning using synchrotron radiation and the polyaniline – PVC blend

Micrometer patterning using synchrotron radiation and the polyaniline – PVC blend In the present work we investigated the localized photodoping process of polyaniline‐emeraldine base/poly(vinylchloride) blends by high‐energy photons from a synchrotron source. The doped blend was characterized using optical and electrical parameters. An abrupt increase of conductivity by four orders of magnitude (10−10 to 10−6 Scm−1) was observed using an initial dose of 500 Jcm−3. Lithographic patterns were recorded with micrometer resolution. Copyright © 2000 John Wiley & Sons, Ltd. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Advanced Materials for Optics and Electronics Wiley

Micrometer patterning using synchrotron radiation and the polyaniline – PVC blend

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References (1)

Publisher
Wiley
Copyright
Copyright © 2000 Wiley Subscription Services, Inc., A Wiley Company
ISSN
1057-9257
eISSN
1099-0712
DOI
10.1002/1099-0712(200011/12)10:6<241::AID-AMO415>3.0.CO;2-S
Publisher site
See Article on Publisher Site

Abstract

In the present work we investigated the localized photodoping process of polyaniline‐emeraldine base/poly(vinylchloride) blends by high‐energy photons from a synchrotron source. The doped blend was characterized using optical and electrical parameters. An abrupt increase of conductivity by four orders of magnitude (10−10 to 10−6 Scm−1) was observed using an initial dose of 500 Jcm−3. Lithographic patterns were recorded with micrometer resolution. Copyright © 2000 John Wiley & Sons, Ltd.

Journal

Advanced Materials for Optics and Electronics – Wiley

Published: Nov 1, 2000

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