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Transport Properties of Ga-Doped PbTe Thin Films on Si Substrates

Transport Properties of Ga-Doped PbTe Thin Films on Si Substrates Thin PbTe films on Si substrates were doped with Ga via annealing in the vapor produced by heating a Ga(l) + GaTe(s) mixture (GaTe(s) + L 1+ Vequilibrium). Electrical measurements showed that the vapor-phase doping reduced the hole concentration in the films by more than two orders of magnitude. IR irradiation was found to reduce the resistivity of the PbTe<Ga> films by a factor of 40–100. The films annealed in the vapor over GaTe(s) + L 1for the longest time exhibited an anomalous temperature variation of resistance, which was interpreted as due to the limited Ga solubility in PbTe. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Inorganic Materials Springer Journals

Transport Properties of Ga-Doped PbTe Thin Films on Si Substrates

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References (18)

Publisher
Springer Journals
Copyright
Copyright © 2002 by MAIK “Nauka/Interperiodica”
Subject
Chemistry; Inorganic Chemistry; Industrial Chemistry/Chemical Engineering
ISSN
0020-1685
eISSN
1608-3172
DOI
10.1023/A:1013687024227
Publisher site
See Article on Publisher Site

Abstract

Thin PbTe films on Si substrates were doped with Ga via annealing in the vapor produced by heating a Ga(l) + GaTe(s) mixture (GaTe(s) + L 1+ Vequilibrium). Electrical measurements showed that the vapor-phase doping reduced the hole concentration in the films by more than two orders of magnitude. IR irradiation was found to reduce the resistivity of the PbTe<Ga> films by a factor of 40–100. The films annealed in the vapor over GaTe(s) + L 1for the longest time exhibited an anomalous temperature variation of resistance, which was interpreted as due to the limited Ga solubility in PbTe.

Journal

Inorganic MaterialsSpringer Journals

Published: Sep 29, 2004

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