Get 20M+ Full-Text Papers For Less Than $1.50/day. Start a 14-Day Trial for You or Your Team.

Learn More →

Manufacturing tolerant topology optimization

Manufacturing tolerant topology optimization Abstract In this paper we present an extension of the topology optimization method to include uncertainties during the fabrication of macro, micro and nano structures. More specifically, we consider devices that are manufactured using processes which may result in (uniformly) too thin (eroded) or too thick (dilated) structures compared to the intended topology. Examples are MEMS devices manufactured using etching processes, nano-devices manufactured using e-beam lithography or laser micro-machining and macro structures manufactured using milling processes. In the suggested robust topology optimization approach, under- and over-etching is modelled by image processing-based “erode” and “dilate” operators and the optimization problem is formulated as a worst case design problem. Applications of the method to the design of macro structures for minimum compliance and micro compliant mechanisms show that the method provides manufacturing tolerant designs with little decrease in performance. As a positive side effect the robust design formulation also eliminates the longstanding problem of one-node connected hinges in compliant mechanism design using topology optimization. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png "Acta Mechanica Sinica" Springer Journals

Manufacturing tolerant topology optimization

"Acta Mechanica Sinica" , Volume 25 (2): 13 – Apr 1, 2009

Loading next page...
 
/lp/springer-journals/manufacturing-tolerant-topology-optimization-k0H8EKo4EN

References (51)

Publisher
Springer Journals
Copyright
2009 The Chinese Society of Theoretical and Applied Mechanics and Springer-Verlag GmbH
ISSN
0567-7718
eISSN
1614-3116
DOI
10.1007/s10409-009-0240-z
Publisher site
See Article on Publisher Site

Abstract

Abstract In this paper we present an extension of the topology optimization method to include uncertainties during the fabrication of macro, micro and nano structures. More specifically, we consider devices that are manufactured using processes which may result in (uniformly) too thin (eroded) or too thick (dilated) structures compared to the intended topology. Examples are MEMS devices manufactured using etching processes, nano-devices manufactured using e-beam lithography or laser micro-machining and macro structures manufactured using milling processes. In the suggested robust topology optimization approach, under- and over-etching is modelled by image processing-based “erode” and “dilate” operators and the optimization problem is formulated as a worst case design problem. Applications of the method to the design of macro structures for minimum compliance and micro compliant mechanisms show that the method provides manufacturing tolerant designs with little decrease in performance. As a positive side effect the robust design formulation also eliminates the longstanding problem of one-node connected hinges in compliant mechanism design using topology optimization.

Journal

"Acta Mechanica Sinica"Springer Journals

Published: Apr 1, 2009

There are no references for this article.