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An ion layer gas reaction dip coating process for the deposition of tungsten trioxide has been developed. Thin films of electrochromic tungsten trioxide with thicknesses of up to 150 nm were prepared. The films were found to be microcrystalline by X-ray diffraction analysis. The growth rate of the films was measured by profilometry. The chemical diffusion coefficient of lithium was investigated as a function of the concentration of lithium by the electrochemical galvanostatic intermittent titration technique. The chemical diffusion coefficient % MathType!Translator!2!1!AMS LaTeX.tdl!TeX -- AMS-LaTeX!% MathType!MTEF!2!1!+-% feaaeaart1ev0aaatCvAUfeBSjuyZL2yd9gzLbvyNv2CaerbuLwBLn% hiov2DGi1BTfMBaeXatLxBI9gBaerbd9wDYLwzYbItLDharqqtubsr% 4rNCHbGeaGqipu0Je9sqqrpepC0xbbL8F4rqqrFfpeea0xe9Lq-Jc9% vqaqpepm0xbba9pwe9Q8fs0-yqaqpepae9pg0FirpepeKkFr0xfr-x% fr-xb9adbaqaaeGaciGaaiaabeqaamaabaabaaGcbaWaaacaaeaaca% WGebaacaGLdmaaaaa!3754! $$\widetilde{D}$$ was found to increase slightly from 7×10−12 to 3×10−1 cm2/s, with x increasing from 0.2 to 0.8 in Li x WO3.
Ionics – Springer Journals
Published: Jun 10, 2006
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