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- Publisher
- Springer Journals
- Copyright
- Copyright © 2015 by Springer-Verlag Berlin Heidelberg
- Subject
- Chemistry; Electrochemistry; Renewable and Green Energy; Optical and Electronic Materials; Condensed Matter Physics; Energy Storage
- ISSN
- 0947-7047
- eISSN
- 1862-0760
- DOI
- 10.1007/s11581-015-1591-z
- Publisher site
- See Article on Publisher Site
Abstract
ZrO2:H thin films were deposited by DC magnetron sputtering at room temperature. The effects of thickness on structure and morphologies of ZrO2:H thin films were lucubrated. The X-ray photoelectron spectroscopy analysis reveals that the fully oxidized value of Zr (Zr4+) exists in both ZrO2 and ZrO2:H films. X-ray diffraction data show the crystallinity of ZrO2:H thin films tends to be weak and the microstructure changes slightly. Atomic force microscopy analysis presents that both the grain size and surface roughness increase as the thickness increases. Correspondingly, all-thin-film ITO/NiO x /ZrO2:H/WO3/ITO electrochromic devices (ECDs) were monolithically fabricated, among which the thickness of ZrO2:H film was adjusted. The ECD assembled with 50 nm ZrO2:H film has the best electrochromic property with transmittance modulation (ΔT) of 65.2 % at 550 nm. The effects of operation potential on ECDs were also elaborated studied. ECDs can get colored in saturated states at relatively high potential as no more unoccupied sites exist in WO3 to accommodate the continuously injected H+ ions.
Journal
Ionics – Springer Journals
Published: Nov 18, 2015