Get 20M+ Full-Text Papers For Less Than $1.50/day. Start a 14-Day Trial for You or Your Team.

Learn More →

Electrical properties and defect chemistry of indium-doped TiO2. Thermoelectric power

Electrical properties and defect chemistry of indium-doped TiO2. Thermoelectric power This work studied the effect of indium on the semiconducting properties of TiO2 (rutile) at elevated temperatures (1023–1273 K) in the gas phase of controlled oxygen activity in the range of 10−16 Pa < p(O2) < 105 Pa. The studies were performed using the measurements of thermoelectric power of In-doped TiO2 (0.4 at.% In) as a function of oxygen activity and temperature. The obtained data indicates that indium is incorporated into the TiO2 lattice according to the dual mechanism leading to the formation of donors and acceptors in the interface (surface and grain boundary) layer and the bulk phase, respectively. This effect is considered in terms of a quasi-isolated surface layer that differs from the bulk phase in terms of semiconducting properties and the related defect disorder. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Ionics Springer Journals

Electrical properties and defect chemistry of indium-doped TiO2. Thermoelectric power

Loading next page...
 
/lp/springer-journals/electrical-properties-and-defect-chemistry-of-indium-doped-tio2-6YYbmz9SGv

References (29)

Publisher
Springer Journals
Copyright
Copyright © 2014 by Springer-Verlag Berlin Heidelberg
Subject
Chemistry; Electrochemistry; Renewable and Green Energy; Optical and Electronic Materials; Condensed Matter Physics; Energy Storage
ISSN
0947-7047
eISSN
1862-0760
DOI
10.1007/s11581-014-1351-5
Publisher site
See Article on Publisher Site

Abstract

This work studied the effect of indium on the semiconducting properties of TiO2 (rutile) at elevated temperatures (1023–1273 K) in the gas phase of controlled oxygen activity in the range of 10−16 Pa < p(O2) < 105 Pa. The studies were performed using the measurements of thermoelectric power of In-doped TiO2 (0.4 at.% In) as a function of oxygen activity and temperature. The obtained data indicates that indium is incorporated into the TiO2 lattice according to the dual mechanism leading to the formation of donors and acceptors in the interface (surface and grain boundary) layer and the bulk phase, respectively. This effect is considered in terms of a quasi-isolated surface layer that differs from the bulk phase in terms of semiconducting properties and the related defect disorder.

Journal

IonicsSpringer Journals

Published: Dec 30, 2014

There are no references for this article.