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Defect passivation on cast-mono crystalline screen-printed cells

Defect passivation on cast-mono crystalline screen-printed cells Abstract Cast-mono crystalline silicon wafers contain crystallographic defects, which can severely impact the electrical performance of solar cells. This paper demonstrates that applying hydrogenation processes at moderate temperatures to finished screen print cells can passivate dislocation clusters within the cast-mono crystalline silicon wafers far better than the hydrogenation received during standard commercial firing conditions. Efficiency enhancements of up to 2% absolute are demonstrated on wafers with high dislocation densities. The impact of illumination to manipulate the charge state of hydrogen during annealing is investigated and found to not be significant on the wafers used in this study. This finding is contrary to a previous study on similar wafers that concluded increased H– or H0 from laser illumination was responsible for the further passivation of positively charged dangling bonds within the dislocation clusters. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png "Frontiers in Energy" Springer Journals

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References (39)

Publisher
Springer Journals
Copyright
2017 Higher Education Press and Springer-Verlag Berlin Heidelberg
ISSN
2095-1701
eISSN
2095-1698
DOI
10.1007/s11708-016-0443-5
Publisher site
See Article on Publisher Site

Abstract

Abstract Cast-mono crystalline silicon wafers contain crystallographic defects, which can severely impact the electrical performance of solar cells. This paper demonstrates that applying hydrogenation processes at moderate temperatures to finished screen print cells can passivate dislocation clusters within the cast-mono crystalline silicon wafers far better than the hydrogenation received during standard commercial firing conditions. Efficiency enhancements of up to 2% absolute are demonstrated on wafers with high dislocation densities. The impact of illumination to manipulate the charge state of hydrogen during annealing is investigated and found to not be significant on the wafers used in this study. This finding is contrary to a previous study on similar wafers that concluded increased H– or H0 from laser illumination was responsible for the further passivation of positively charged dangling bonds within the dislocation clusters.

Journal

"Frontiers in Energy"Springer Journals

Published: Mar 1, 2017

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