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M. Lieberman, A. Lichtenberg (1994)
Principles of Plasma Discharges and Materials Processing
G. Oehrlein (1997)
Surface processes in low pressure plasmasSurface Science, 386
P. Leech (1999)
Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmasVacuum, 55
C. Weigel, S. Sinzinger, M. Hoffmann (2018)
Deep etched and released microstructures in Zerodur in a fluorine-based plasmaMicroelectronic Engineering
V. Arrizon, S. Sinzinger (1997)
Modified quantization schemes for Fourier-type array generatorsOptics Communications, 140
I. Rangelow (2003)
Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systemsJournal of Vacuum Science and Technology, 21
E. Manske, G. Jäger, T. Hausotte, R. Füßl (2012)
Recent developments and challenges of nanopositioning and nanomeasuring technologyMeasurement Science and Technology, 23
K. Knapper, K. Heylman, E. Horak, R. Goldsmith (2016)
Chip‐Scale Fabrication of High‐Q All‐Glass Toroidal Microresonators for Single‐Particle Label‐Free ImagingAdvanced Materials, 28
J. Miller, M. Taghizadeh, J. Turunen, N. Ross (1993)
Multilevel-grating array generators: fabrication error analysis and experiments.Applied optics, 32 14
Simon Hartlieb, Michael Tscherpel, Flavio Guerra, T. Haist, W. Osten, Michael Ringkowski, O. Sawodny (2020)
Hochgenaue Kalibrierung eines holografischen Multi-Punkt-Positionsmesssystemstm - Technisches Messen, 87
Xinghua Li, T. Abe, M. Esashi (2001)
Deep reactive ion etching of Pyrex glass using SF6 plasmaSensors and Actuators A-physical, 87
(1991)
process variables critical to optical efficiency,” J
K. Tantawi, Janeczka Oates, R. Kamali-Sarvestani, N. Bergquist, John Williams (2010)
Processing of photosensitive APEX™ glass structures with smooth and transparent sidewallsJournal of Micromechanics and Microengineering, 21
(2000)
Reaction mechanisms and SiO2 profile evolution in fluorocarbon plasmas,
M. Hussein, K. Worhoff, G. Sengo, A. Driessen (2003)
Stability of low refractive index PECVD silicon oxynitride layers
(1979)
Spectral characteristic of stepped-phase gratings,
Banqiu Wu (2006)
Photomask plasma etching: A reviewJournal of Vacuum Science & Technology B, 24
R. Conradt (2008)
Chemical Durability of Oxide Glasses in Aqueous Solutions: A ReviewJournal of the American Ceramic Society, 91
T. Standaert, C. Hedlund, E. Joseph, G. Oehrlein, T. Dalton (2004)
Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbideJournal of Vacuum Science and Technology, 22
M. Pedersen, M. Huff (2017)
Development of Process Recipes for Maximum Mask Etch Selectivity and Maximum Etch Rate Having Vertical Sidewalls for Deep, Highly-Anisotropic Inductively-Coupled Plasma (ICP) Etching of Fused SilicaECS Journal of Solid State Science and Technology, 6
Zongliang Cao, B. Vanderelzen, K. Owen, Jialiang Yan, Guohong He, R. Peterson, D. Grimard, K. Najafi (2013)
Drie of fused silica2013 IEEE 26th International Conference on Micro Electro Mechanical Systems (MEMS)
(2008)
first results,” in Proceedings of the 4th International Conference on Multi Material Micro Manufacture, S
V. Ishchuk, D. Olynick, Zuwei Liu, I. Rangelow (2015)
Profile simulation model for sub-50 nm cryogenic etching of silicon using SF6/O2 inductively coupled plasmaJournal of Applied Physics, 118
C. Weigel, M. Schulze, H. Gargouri, M. Hoffmann (2018)
Deep etching of Zerodur glass ceramics in a fluorine-based plasmaMicroelectronic Engineering
K. Kurisu, T. Okada, K. Ebata (2004)
Developments in SiO2 multistep diffractive optical element for beam homogenizing, 5347
W.E Kline, H. Fogler (1981)
Dissolution kinetics: Catalysis by strong acids, 82
(2011)
Optimierung der NIR absorption von fotostrukturierbarem Glas für MORES
T. Ray, Haixin Zhu, D. Meldrum (2010)
Deep reactive ion etching of fused silica using a single-coated soft mask layer for bio-analytical applicationsJournal of Micromechanics and Microengineering, 20
(1998)
Ätzverfahren für die Mikrotechnik, Wiley-VCH
Laicun Lin, X. Jing, Qidong Wang, Feng Jiang, Liqiang Cao, Daquan Yu (2016)
Investigation of fused silica glass etching using C4F8/Ar inductively coupled plasmas for through glass via (TGV) applicationsMicrosystem Technologies, 22
Ulrike Brokmann, M. Jacquorie, M. Talkenberg, A. Harnisch, E. Kreutz, D. Hülsenberg, R. Poprawe (2002)
Exposure of photosensitive glasses with pulsed UV-laser radiationMicrosystem Technologies, 8
(2018)
main features and application in micro-and nanotechnology and in surface treatment,” C
C. Weigel, Eric Markweg, Lutz Mller, M. Schulze, H. Gargouri, M. Hoffmann (2017)
A monolithic micro-optical interferometer deep etched into fused silicaMicroelectronic Engineering, 174
D. Hülsenberg, A. Harnisch, A. Bismarck (2008)
Microstructuring of Glasses
J. Coburn, H. Winters (1981)
Plasma etching - a discussion of mechanismsCritical Reviews in Solid State and Materials Sciences, 10
V. Donnelly, A. Kornblit (2013)
Plasma etching: Yesterday, today, and tomorrowJournal of Vacuum Science and Technology, 31
C. Cardinaud (2018)
Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatmentComptes Rendus Chimie
Brian Kim, E. Meng (2015)
Review of polymer MEMS micromachiningJournal of Micromechanics and Microengineering, 26
U. Krackhardt, N. Streibl, J. Schwider (1994)
Fabrication errors of computer generated multilevel phase-hologramsOptik, 95
Julian Wüster, Y. Bourgin, P. Fesser, Arne Behrens, S. Sinzinger (2021)
Nano-imprinted subwavelength gratings as polarizing beamsplittersJournal of the European Optical Society-Rapid Publications, 17
Zhongke Wang, K. Sugioka, K. Midorikawa (2008)
Fabrication of integrated microchip for optical sensing by femtosecond laser direct writing of Foturan glassApplied Physics A, 93
K. Mersereau, C. Nijander, A. Feldblum, W. Townsend (1993)
Fabrication and measurement of fused silica microlens arrays, 1751
H. Winters, J. Coburn (1992)
Surface Science Aspects of Etching ReactionsChemInform, 23
C. Anthony, P. Docker, P. Prewett, K. Jiang (2008)
Focused ion beam microfabrication in Foturan™ photosensitive glassJournal of Micromechanics and Microengineering, 17
Chenchen Zhang, S. Tadigadapa (2018)
Modified inductively coupled plasma reactive ion etch process for high aspect ratio etching of fused silica, borosilicate and aluminosilicate glass substratesSensors and Actuators A-physical, 273
T. Kippenberg, D. Armani, S. Spillane, K. Vahala (2003)
Ultra-high-Q toroid microcavity on a chipNature, 421
(1979)
a discussion of mechanisms,” J
P. Mondal, Mukund Kumar, P. Tiwari, A. Srivastava, J. Chakera, P. Naik (2016)
Experimental realization of Talbot array illumination for a 2-dimensional phase gratingJournal of Applied Physics, 120
K. Hrdina, C. Duran (2014)
ULE®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics SubstratesInternational Journal of Applied Glass Science, 5
G. Spierings (1993)
Wet chemical etching of silicate glasses in hydrofluoric acid based solutionsJournal of Materials Science, 28
Ulrike Brokmann, T. Milde, E. Rädlein, K. Liefeith (2019)
Fabrication of 3D microchannels for tissue engineering in photosensitive glass using NIR femtosecond laser radiationBiomedical Glasses, 5
M. Stern, M. Holz, S. Medeiros, R. Knowlden (1991)
Fabricating binary optics: Process variables critical to optical efficiencyJournal of Vacuum Science & Technology B, 9
(2018)
Phys
(2016)
a new powerful tool for large-range micro- and nanotechnology,” Surf
F. Livingston, H. Helvajian (2005)
Variable UV laser exposure processing of photosensitive glass-ceramics: maskless micro- to meso-scale structure fabricationApplied Physics A, 81
W. Dallas (1971)
Phase Quantization-a Compact Derivation.Applied optics, 10 3
J. Schmitt, A. Meier, U. Wallrabe, F. Völklein (2018)
Reactive ion etching (CF4/Ar) and ion beam etching of various glasses for diffractive optical element fabricationInternational Journal of Applied Glass Science
R. Kirchner, N. Chidambaram, H. Schift (2018)
Benchmarking surface selective vacuum ultraviolet and thermal postprocessing of thermoplastics for ultrasmooth 3-D-printed micro-opticsOptical Engineering, 57
T. Park, J. Min, Dong-Chul Han, Yeongtaek Oh, Wonjin Seo (2011)
The characteristics of glass deep dry etching process with a single PR mask2011 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
D. Monk, D. Soane, R. Howe (1993)
A review of the chemical reaction mechanism and kinetics for hydrofluoric acid etching of silicon dioxide for surface micromachining applicationsThin Solid Films, 232
J. Shaffer, H. Bennett (1984)
Effect of thermal cycling on dimensional stability of Zerodur and ULE.Applied optics, 23 17
K. Tantawi, Emmanuel Waddel, John Williams (2013)
Structural and composition analysis of Apex™ and Foturan™ photodefinable glassesJournal of Materials Science, 48
N. Borrelli, D. Morse, R. Bellman, W. Morgan (1985)
Photolytic technique for producing microlenses in photosensitive glass.Applied optics, 24 16
C. Weigel, Hai Phi, Felix Denissel, M. Hoffmann, S. Sinzinger, S. Strehle (2021)
Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion GlassAdvanced Engineering Materials, 23
(2019)
Design and manufacturing method of fundamental beam mode shaper for adapted laser beam profile in laser material processing,”Materials
S. Queste, G. Ulliac, J. Jeannot, C. Malek (2008)
DRIE of non-conventional materials: first results
A. Sankaran, M. Kushner (2003)
Fluorocarbon plasma etching and profile evolution of porous low-dielectric-constant silicaApplied Physics Letters, 82
H. Winters (1980)
Elementary processes at solid surfaces immersed in low pressure plasmas
D. Zeze, R. Forrest, J. Carey, D. Cox, I. Robertson, B. Weiss, S. Silva (2002)
Reactive ion etching of quartz and Pyrex for microelectronic applicationsJournal of Applied Physics, 92
(2007)
Focused ion beam microfabrication in FoturanTM photosensitive glass,
(2016)
ULE corning code 7972 ultra low expansion glass: datasheet
(1993)
fabrication error analysis and experiments,” Appl
S. Wilkins, D. Coon, J. Epstein (1989)
Elastic Hysteresis Phenomena In ULE And Zerodur Optical Glasses At Elevated Temperatures, 0970
(2005)
maskless micro- to meso-scale structure fabrication,” Appl
Yue Shi, Liang He, Fangcao Guang, Luhai Li, Zhiqing Xin, Ruping Liu (2019)
A Review: Preparation, Performance, and Applications of Silicon Oxynitride FilmMicromachines, 10
(1981)
catalysis by strong acids,” J
O. Joubert, P. Czupryński, F. Bell, P. Berruyer, R. Blanc (1997)
Analyses of the chemical topography of silicon dioxide contact holes etched in a high density plasma sourceJournal of Vacuum Science & Technology B, 15
Jung-Kab Park, N. Lee, Jaechan Lee, Joon-Shik Park, H. Park (2005)
Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmasMicroelectronic Engineering, 82
T. Ichiki, Y. Sugiyama, T. Ujiie, Y. Horiike (2003)
Deep dry etching of borosilicate glass using fluorine-based high-density plasmas for microelectromechanical system fabricationJournal of Vacuum Science & Technology B, 21
A. Carapella, C. Duran, K. Hrdina, D. Sears, J. Tingley (2013)
ULE® Glass for EUVL applications, a fictive temperature correlationJournal of Non-crystalline Solids, 367
G. Jäger, E. Manske, T. Hausotte, A. Müller, F. Balzer (2016)
Nanopositioning and nanomeasuring machine NPMM-200—a new powerful tool for large-range micro- and nanotechnologySurface Topography: Metrology and Properties, 4
K. Kolari (2008)
Deep plasma etching of glass with a silicon shadow maskSensors and Actuators A-physical, 141
H. Kikuta, Y. Ohira, K. Iwata (1997)
Achromatic quarter-wave plates using the dispersion of form birefringence.Applied optics, 36 7
J. Goodman, A. Silvestri (1970)
Some effects of Fourier-domain phase quantizationIbm Journal of Research and Development, 14
L. Lallement, C. Gosse, C. Cardinaud, M. Peignon-Fernandez, A. Rhallabi (2010)
Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabricationJournal of Vacuum Science and Technology, 28
M. Eisner, J. Schwider (1996)
Transferring resist microlenses into silicon by reactive ion etchingOptical Engineering, 35
R. Brunner, M. Burkhardt, A. Pesch, O. Sandfuchs, M. Ferstl, S. Hohng, J. White (2004)
Diffraction-based solid immersion lens.Journal of the Optical Society of America. A, Optics, image science, and vision, 21 7
W. Mitchell, B. Thibeault, D. John, T. Reynolds (2021)
Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch maskJournal of Vacuum Science & Technology A
M. Huff (2021)
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio MicrofabricationMicromachines, 12
R. Machorro, E. Samano, G. Soto, F. Villa, L. Cota-Araiza (2000)
Modification of refractive index in silicon oxynitride films during depositionMaterials Letters, 45
K. Nojiri (2014)
Dry Etching Technology for Semiconductors
(2014)
Properties of Zerodur
Walter Riker (2010)
A Review of J
Duncan Moore (1980)
Gradient-Index Optics: A Review, 0237
(2013)
yesterday, today, and tomorrow,” J
Cheng-Hsiang Lin, Lan Jiang, Y. Chai, H. Xiao, Shean-Jen Chen, H. Tsai (2009)
Fabrication of microlens arrays in photosensitive glass by femtosecond laser direct writingApplied Physics A, 97
G. Franz (2009)
Low Pressure Plasmas and Microstructuring Technology
(2004)
Design, Fabrication, and Test, vol
M. Ahamed, D. Senkal, A. Trusov, A. Shkel (2013)
Deep NLD plasma etching of Fused Silica and Borosilicate Glass2013 IEEE SENSORS
(1997)
Oehrlein, “Surface processes in low pressure plasmas,
(2003)
Microelectron
H. Bartelt, T. Glaser, S. Schröter (2001)
Modelling and characterization of optical high frequency gratingsOptik, 112
J. Amako, D. Sawaki, E. Fujii (2009)
High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference lithography.Applied optics, 48 27
Kyojiro Morikawa, K. Matsushita, Takehiko Tsukahara (2017)
Rapid Plasma Etching for Fabricating Fused Silica MicrochannelsAnalytical Sciences, 33
P. Lalanne, Dominique Lemercier-lalanne (1996)
On the effective medium theory of subwavelength periodic structuresJournal of Modern Optics, 43
Eric Markweg, M. Hillenbrand, S. Sinzinger, Martin Hoffmann (2012)
Planar plano-convex microlens in silica using ICP-CVD and DRIE, 8550
W. Kline, H. Fogler (1981)
Dissolution of silicate minerals by hydrofluoric acidIndustrial & Engineering Chemistry Fundamentals, 20
G. Ghosh (1999)
Dispersion-equation coefficients for the refractive index and birefringence of calcite and quartz crystalsOptics Communications, 163
(2014)
Elements, Systems and Applications, Chapman and Hall/CRC
T. Michalske, S. Freiman (1983)
A Molecular Mechanism for Stress Corrosion in Vitreous SilicaJournal of the American Ceramic Society, 66
K. Lindsey, A. Franks (1979)
Metal Optics Versus Glass Optics, 0163
(1980)
a review,” Appl
C. Bischoff, F. Völklein, J. Schmitt, U. Rädel, U. Umhofer, Erwin Jäger, A. Lasagni (2019)
Design and Manufacturing Method of Fundamental Beam Mode Shaper for Adapted Laser Beam Profile in Laser Material ProcessingMaterials, 12
(2017)
Foturan II: Photostructurable glass wafer
K. Sugioka, Y. Hanada, K. Midorikawa (2010)
Three‐dimensional femtosecond laser micromachining of photosensitive glass for biomicrochipsLaser & Photonics Reviews, 4
Meike Hofmann received her PhD from Technische Universität Ilmenau in 2013 and spent more than 4 years at the IMTEK in Freiburg (Germany) on research in the field of micro-optics
M. Serényi, M. Rácz, T. Lohner (2001)
Refractive index of sputtered silicon oxynitride layers for antireflection coatingVacuum, 61
(2006)
Synthetic fused silica-optical and technical grades: data sheet,
(2011)
Brokmann, “Optimierung der NIR absorption von fotostrukturierbarem Glas für MORES,
V. Donnelly, D. Flamm, W. Dautremont-Smith, D. Werder (1984)
Anisotropic etching of SiO2 in low‐frequency CF4/O2 and NF3/Ar plasmasJournal of Applied Physics, 55
Lucila Cescato, Ekkehart Gluch, N. Streibl (1990)
Holographic quarterwave plates.Applied optics, 29 22
V. Bliznetsov, H. Lin, Yue-Jia Zhang, David Johnson (2015)
Deep SiO2 etching with Al and AlN masks for MEMS devicesJournal of Micromechanics and Microengineering, 25
J. Jahns, M. Downs, M. Prise, N. Streibi, S. Walker (1989)
Dammann Gratings For Laser Beam ShapingOptical Engineering, 28
F. Ernsberger (1960)
Structural effects in the chemical reactivity of silica and silicatesJournal of Physics and Chemistry of Solids, 13
J. Pepi, D. Golini (1991)
Delayed elastic effects in the glass ceramics Zerodur and ULE at room temperature.Applied optics, 30 22
C. Herzinger, B. Johs, W. McGahan, J. Woollam, W. Paulson (1998)
Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigationJournal of Applied Physics, 83
(2010)
implications for microfluidic devices fabrication,” J
Abstract.We provide a review of the latest research findings as well as the future potential of plasma-based etching technology for the fabrication of micro-optical components and systems. Reactive ion etching (RIE) in combination with lithographic patterning is a well-established technology in the field of micro- and nanofabrication. Nevertheless, practical implementation, especially for plasma-based patterning of complex optical materials such as alumino-silicate glasses or glass-ceramics, is still largely based on technological experience rather than established models. Such models require an in-depth understanding of the underlying chemical and physical processes within the plasma and at the glass–plasma/mask–plasma interfaces. We therefore present results that should pave the way for a better understanding of processes and thus for the extension of RIE processes toward innovative three-dimensional (3D) patterning as well as for the processing of chemically and structurally inhomogeneous silicate-based substrates. To this end, we present and discuss the results of a variety of microstructuring strategies for different application areas with a focus on micro-optics. We consider the requirements for refractive and diffractive micro-optical systems and highlight potentials for 3D dry chemical etching by selective tailoring of the material structure. The results thus provide first steps toward a knowledge-based approach to RIE processing of universal dielectric glass materials for optical microsystems, which also has a significant impact on other microscale applications.
Journal of Optical Microsystems – SPIE
Published: Oct 1, 2021
Keywords: optical microsystems; diffractive optics; silicate glasses; reactive ion etching; optical micro- and nanostructures; three-dimensional microstructuring
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