Optimum collimator for proximity X-ray lithography — Theoretical analysis
Optimum collimator for proximity X-ray lithography — Theoretical analysis
Igor A. Artioukov ; Igor V. Kozhevnikov ; Nataliya I. Kozhevnikova
1998-01-01 00:00:00
The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence.
http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.pngJournal of X-Ray Science and TechnologyIOS Presshttp://www.deepdyve.com/lp/ios-press/optimum-collimator-for-proximity-x-ray-lithography-theoretical-4OYOl5300g
Optimum collimator for proximity X-ray lithography — Theoretical analysis
The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence.
Journal
Journal of X-Ray Science and Technology
– IOS Press
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