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Optimum collimator for proximity X-ray lithography — Theoretical analysis

Optimum collimator for proximity X-ray lithography — Theoretical analysis The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of X-Ray Science and Technology IOS Press

Optimum collimator for proximity X-ray lithography — Theoretical analysis

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Publisher
IOS Press
Copyright
Copyright © 1998 by IOS Press, Inc
ISSN
0895-3996
eISSN
1095-9114
Publisher site
See Article on Publisher Site

Abstract

The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence.

Journal

Journal of X-Ray Science and TechnologyIOS Press

Published: Jan 1, 1998

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