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Design of an ultraviolet projection lens by using a global search algorithm and computer optimization

Design of an ultraviolet projection lens by using a global search algorithm and computer... Abstract This paper describes a method for designing an ultraviolet (UV) projection lens for microlithography. Our approach for meeting this objective is to use a starting design automatically obtained by the DSEARCH feature in the SYNOPSYS™ lens design program. We describe the steps for getting a desired starting point for the projection lens and discuss optimization problems unique to this system, where the two parts of the projection lens are designed independently. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Advanced Optical Technologies de Gruyter

Design of an ultraviolet projection lens by using a global search algorithm and computer optimization

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References (19)

Publisher
de Gruyter
Copyright
Copyright © 2017 by the
ISSN
2192-8576
eISSN
2192-8584
DOI
10.1515/aot-2016-0058
Publisher site
See Article on Publisher Site

Abstract

Abstract This paper describes a method for designing an ultraviolet (UV) projection lens for microlithography. Our approach for meeting this objective is to use a starting design automatically obtained by the DSEARCH feature in the SYNOPSYS™ lens design program. We describe the steps for getting a desired starting point for the projection lens and discuss optimization problems unique to this system, where the two parts of the projection lens are designed independently.

Journal

Advanced Optical Technologiesde Gruyter

Published: Feb 1, 2017

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