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Abstract This paper describes a method for designing an ultraviolet (UV) projection lens for microlithography. Our approach for meeting this objective is to use a starting design automatically obtained by the DSEARCH feature in the SYNOPSYS™ lens design program. We describe the steps for getting a desired starting point for the projection lens and discuss optimization problems unique to this system, where the two parts of the projection lens are designed independently.
Advanced Optical Technologies – de Gruyter
Published: Feb 1, 2017
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