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Coherent diffractive imaging methods for semiconductor manufacturing

Coherent diffractive imaging methods for semiconductor manufacturing AbstractThe paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Advanced Optical Technologies de Gruyter

Coherent diffractive imaging methods for semiconductor manufacturing

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Publisher
de Gruyter
Copyright
©2017 THOSS Media & De Gruyter, Berlin/Boston
ISSN
2192-8584
eISSN
2192-8584
DOI
10.1515/aot-2017-0052
Publisher site
See Article on Publisher Site

Abstract

AbstractThe paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light.

Journal

Advanced Optical Technologiesde Gruyter

Published: Dec 20, 2017

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