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F. Hua, Yugang Sun, A. Gaur, M. Meitl, L. Bilhaut, L. Rotkina, Jingfeng Wang, P. Geil, M. Shim, J. Rogers, A. Shim (2004)
Polymer Imprint Lithography with Molecular-Scale ResolutionNano Letters, 4
C. Chao, L. Guo (2002)
Polymer microring resonators fabricated by nanoimprint techniqueJournal of Vacuum Science & Technology B, 20
(2011)
Microelectron
M. Malloy, L. Litt (2011)
Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturingJournal of Micro-nanolithography Mems and Moems, 10
Wei Zhang, S. Chou (2001)
Multilevel nanoimprint lithography with submicron alignment over 4 in. Si wafersApplied Physics Letters, 79
R. Ji, M. Hornung, M. Verschuuren, R. Laar, J. Eekelen, U. Plachetka, M. Moeller, C. Moormann (2010)
UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturingMicroelectronic Engineering, 87
A. Lebib, Y. Chen, J. Bourneix, F. Carcenac, E. Cambril, L. Couraud, H. Launois (1999)
Nanoimprint lithography for a large area pattern replicationMicroelectronic Engineering, 46
(2003)
Nano Lett
Hyunsik Yoon, Sung Lee, S. Sung, K. Suh, K. Char (2011)
Mold design rules for residual layer-free patterning in thermal imprint lithography.Langmuir : the ACS journal of surfaces and colloids, 27 12
D. Truffier-Boutry, A. Beaurain, R. Galand, B. Pélissier, J. Boussey, M. Zelsmann (2010)
XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithographyMicroelectronic Engineering, 87
(2011)
in ‘Chips 2020
S. Landis, P. Brianceau, N. Chaix, Y. Désières, V. Reboud, M. Argoud (2012)
Metallic colour filtering arrays manufactured by nanoimprint lithography, 8428
B. Hoefflinger (2011)
ITRS: The International Technology Roadmap for Semiconductors
Michael McAlpine, Robin Friedman, Charles Lieber (2003)
Nanoimprint Lithography for Hybrid Plastic ElectronicsNano Letters, 3
T. Eriksson, S. Yamada, P. Krishnan, S. Ramasamy, B. Heidari (2011)
High volume nanoimprint lithography on III/V substratesMicroelectronic Engineering, 88
(2011)
MEMS MOEMS 10
U. Plachetka, M. Bender, A. Fuchs, B. Vratzov, T. Glinsner, F. Lindner, H. Kurz (2004)
Wafer scale patterning by soft UV-nanoimprint lithographyMicroelectronic Engineering, 73
(2006)
OnBoard Technology
Sheehan (2009)
SPIE Advanced LithographySpie Professional
(2011)
Langmuir 27
AbstractTo evaluate the maturity of the wafer-scale NanoImprint lithography (NIL) process, laboratory of electronic and communication technology (LETI) and EV Group (EVG) launched the Imprint Nanopatterning Solution Platform for Industrial Assessment program (INSPIRE), which aims at building a nanoimprint solution platform for industrial assessment and provide a unique open ecosystem for the standardization of the nanoimprint process. This program enabled to gather EVG know-how for the tool manufacturing and its long expertise in bonding activities, and the established methods and advanced microelectronic environment. Presented as an upstream phase, metrology and defectivity were performed on dedicated assessment designs to address critical dimension uniformity (CDU) at wafer scale for a large number of imprints, defectivity on imprints and masters, and alignment capabilities of the nanoimprint HERCULES® platform of EVG. We demonstrate that the critical points are the anti-sticking layer for the defectivity, the CD shrinkage for the CDU, and the stiffness of the soft stamp for the overlay uniformity. Thus, we bring to light the actual capabilities of the HERCULES® platform, and open the discussions on the opportunities for this technology with the possible improvements for the process.
Advanced Optical Technologies – de Gruyter
Published: Jun 27, 2017
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